Abstract
We present a broadband terahertz wave modulator with large modulation depth and fast switch speed by cautiously selecting the gate dielectric materials in a large-area graphene field-effect transistor (GFET). An ultrathin Al2O3 film (~60 nm) is deposited by atomic-layer-deposition technique as a high-ΔΈ gate dielectric layer, which reduces the Coulomb impurity scattering and cavity effect thus greatly improves the modulation performance. Our modulator has achieved a high modulation depth of 22 % and modulation speed of 170 kHz in a frequency range from 0.4 to 1.5 THz, which is vital for many THz technology applications as well as for fundamental researches.
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